COE Spring 2002 Conference & TechniFair: Last Chance to Save $325!

Come see the hottest industry trends for 2002 and beyond in Palm Springs, April 14-17. The COE Spring 2002 Conference & TechniFair will bring together more than a thousand users within the Dassault Systemes - CATIA®, ENOVIA^TM, DELMIA^TM, and SMARTEAM™ - community for nearly 200 user-focused training and educational breakout sessions, advanced product demonstrations, hands-on training, networking with peers from around the world, and a showcase of the latest products and services from nearly 50 solutions providers.

General Session Highlights:

* Hear how famed Voyager Pilot Dick Rutan battled sleeplessness and adverse weather conditions to successfully complete the first-ever, around-the-world, non-stop, re-fueled flight.

* Find out from Dassault Systemes President Bernard Charles how 3D-PLM solutions are helping companies capture and leverage their intellectual capital.

* IBM PLM Solutions General Manager Ed Petrozelli discusses how IBM PLM customers are managing processes from the initial concept to maintenance in the field and the vision for the future of PLM.

Sessions from more than 40 companies, including:

• Black & Decker
• BMW
• Electric Boat
• DaimlerChrysler
• Lockheed-Martin
• Bombardier
• Coca-Cola
• Airbus
• Aerostructures Corp.
• Raytheon

Plus - Work hand-in-hand with Dassault Systemes developers to voice your own needs and requirements in the development of future software releases.

The early registration discount is only available through Friday, March 1st so act now to save $325 on your registration fee. Visit the Conference Page for easy online registration, and to view the full conference program, including up-to-the-minute details on speakers, sessions, special events, and hotel and special travel discounts.

New Process Interest Committee Structure

COE has always been fortunate to have an excellent group of hard working industry experts, who volunteer their time in the interest of disseminating information on the implementation of Dassault Systemes (DS) products. These hard working, well-known individuals are Process Interest Committee (PIC) chairpersons. For the past year the Process Interest Committee organization has been operating under a new structure. This new structure organizes the PIC committees into five new divisions or domains. The new arrangement is designed to be more like the product development structure at DS and at IBM. Each of the five PIC divisions has at least one manager, which has been recruited from the ranks of the PIC committee chairman. DS and IBM have named industry experts from their companies to serve as counterparts and liaisons the respective PIC division. The five divisions, and managers, are as follows:

The new PIC organizational structure has served to improve and increase the communication between COE PICs, DS and IBM, as it was designed. That is not to say that everything is perfect, as that would not be true representation. However, everyone is growing more comfortable with this system, and areas of weakness are being eliminated continuously. Old procedures are being refined and new ones defined. The PIC organization and its structure is a living entity which must and will continuously change and improve in order to keep up with a fast moving industry. Come experience it for yourself in Palm Springs, this Spring.

Process Interest Committees Focus on the Hot Issues of Today

More than 100 breakout sessions will focus on technically specific aspects of CATIA, ENOVIA, DELMIA, and SMARTEAM-related solutions, including process, functionality, systems, support, and implementation.

PIC Divisions and Session Categories
COE's Process Interest Committees (PICs) provide a forum for process-related presentation, demonstration, and discussion. These forums are presented in multiple breakout sessions running in parallel. PIC session topics are dedicated to furthering the knowledge and implementation of Dassault Systemes' CATIA, ENOVIA, DELMIA, and SMARTEAM solutions. The breakout sessions are arranged in divisions, which are organized by process discipline to minimize session conflicts. Each PIC area is chaired by users and supported in its work by specialists from Dassault Systemes, IBM, and their various business partners.

For a detailed list of PIC breakout sessions, visit the Web site at www.coe.org.

Every product and function of CATIA, ENOVIA, DELMIA, and SMARTEAM is mapped into the five PIC Divisions:

PIC Division 1: Product Definition
EME: Electro-Mechanical Engineering
TD: Tool Design
AS: Engineering Analysis and Simulation
PD: Product Design
VPS: Visual Product Simulation

Overview: Recent industry-level developments in technology have been focused on migrating product development, definition, and simulation from 2D to 3D for certain necessary digital enterprise components. These efforts have enriched the "form and fit" predictive tools for virtual insight into how products will look, operate, and assemble, prior to committing materials or cutting chips. Engineering analysis tools are necessary for insight into the "functional" performance of products in the virtual world. 3D-CAD is an enabler for full integration of "form, fit, and function," as required for innovative, collaborative product definition teams. Only with the 3F capabilities integrated within an e-collaborative digital enterprise will innovative 3D virtual product definition be fully realized. Realistic simulations of the physical behavior of new products will be effective, including static, dynamic, mechanical, and thermal load environments, as well as performance of ergonomic studies for their assembly, operation, and maintenance. The COE Product Definition Division will focus on user experiences and present system capabilities of the Dassault Systemes family of products and their integration with related technologies and tools.

PIC Division 2: Manufacturing
NC: Numerical Control
INS: Inspection
A/R: Assembly and Robotics
MAN: Manufacturing Processes

Overview: The program will include user implementation experience sharing, views into selected aspects of the technology, and training. One will have the opportunity to walk through current V5 NC manufacturing implementation with case studies from both the U.S. and Europe. The technology perspective will focus on the core of the V4/V5 machining operations solution and post-processing. The MFG training opportunities at the conference will be with the Version 5 products Surface Machining (SMG) and Lathe Machining (LMG). Several sessions have been developed to clarify the DELMIA extended manufacturing product offering and the coordinate measurement machine (CMM) programming solution. This conference program will also offer a "tips and techniques" session to help build references toward best practices in NC manufacturing using CATIA Version 5.

PIC Division 3: Information Management
IDM: Information Management
COL: Collaboration
DE: Data Exchange
DM: Data Migration
L/S: Library and Standards

Overview: ENOVIAVPM has expanded its capabilities by allowing customers to store CATIA V5 data. How will attendees share ideas and practices to manage V5 and V4 information in a single database? During the next few years the need to have harmony among both versions of CATIA is critical to the bottom line cost of every OEM and medium and small CATIA customer. During this spring's COE conference, the Information Management team plans to share standard practices through presentations and workshops with a theme of managing new and legacy information in multiple versions of CATIA data. Many of the questions you have asked yourself could be answered within the suite of Process Interest Committee presentations that reside under the Information Management Division.

PIC Division 4: Infrastructure
SQA: Software Quality Assurance
KBE: Knowledge-Based Engineering
TR: Training
SYS: Systems Software, Hardware, and Administration

Overview: The Infrastructure Division includes PIC sessions on the basic installations and facilities that cross the entire ENOVIA and Dassault Systemes portfolio. There will be many sessions related to programming with VB and the new CAA product, as well as systems software and hardware selection (SYS Committee). The Infrastructure Division also presents breakout sessions that deal with the capture and reuse of corporate knowledge and expertise, as well as technologies in the Knowledge-Based Engineering (KBE) Committee. Training (TR) sessions will be geared to helping improve the education and productivity of the users. The Software Quality Assurance (SQA) Committee will discuss issues that relate to defining an integrated and validated set of Dassault Systemes products for the digital enterprise PLM customer. The Infrastructure Division will provide many breakout and hands-on training sessions. These sessions will help the system administrators and application programmers, as well as producers and consumers of corporate knowledge, to evolve and prepare for the future.

PIC Division 5: Industry Specific
SME: Small and Medium Enterprises
AUTO: Automotive
SPD: Shipbuilding and Plant Design
AC: Academic
VS: Vendor Solutions

Overview: The mission of the Industry Specific Division is to provide breakout sessions that address the very latest information on topics of interest to specific industry segments. The SME sessions will provide a forum for sharing Dassault Systemes suite implementation experiences by smaller companies. In the AC sessions, hear about projects where industry and education have worked together to address specific problems in academia. Sessions may also focus on helping teachers meet their challenges with infusing CATIA, DELMIA, and ENOVIA into a curriculum. Automotive will provide sessions on the latest tools developed to address today's automotive industry needs. One of the newer PICs is SPD. As the audience for these sessions continues to grow, we can expect to see these industries separate and possibly form several new committees. Currently sessions center around the commonality in many aspects of large construction project design. Finally, VS sessions will provide attendees with the opportunity to see the latest technology available from SCP partners and third party vendors, complementing existing CATIA, DELMIA, and ENOVIA functionality. Attendees will be provided with an opportunity to discuss these solutions, develop industry contacts, and speak with other company representatives about their approach to solving today's issues.

Development Planning Council Sessions…Influence the Future of the Software

What are the DPCs?
The DPCs (Development Planning Councils) are the committees that communicate enhancement requests with Dassault Systemes and IBM. The DPC strategy meetings disclose the present and future direction of products related to specific functions and processes. The working DPC sessions review status on enhancement requests and prioritize and submit new enhancement requests.

Strategy (Open) Session
The strategy sessions focus on strategy with in-depth demonstrations of the latest products and customer cases. These presentations and demonstrations are provided by the Dassault Systemes domain leaders. Come see the latest in CATIA, ENOVIA, DELMIA, and SMARTEAM functions and capabilities that will be available in the future.

Working (Closed) Session
The working sessions are where new enhancement requests are generated. These sessions are for members only who have signed non-disclosure agreements. Attend these sessions to share your experiences, exchange ideas, and suggest enhancements for future releases.

Every product and function of CATIA, ENOVIA, DELMIA, and SMARTEAM are mapped into five DPC divisions:

Process Group: Product Life
EPL: ENOVIA PORTAL
DPS: Digital Product Synthesis
LCA: Life Cycle Application
EEA: ENOVIA/Enterprise Architecture and PPR HUB

Overview: Individually these four DPC teams cover key product elements from Dassault Systemes, ENOVIA, and DELMIA that address collaboration, simulation, virtual product development and data model structures. The COE 2002 Spring Conference will differ from past conferences in that the developers of these products will demonstrate real-life scenarios on how user companies are gaining value by utilizing these products.

Process Group: Engineering
CSM: Composites and Sheetmetal
KBE: Knowledge-Based Engineering
DRA: Drafting
SPA: Solid Part Design and Assembly
SDS: Shape Design and Styling
ENA: Engineering Analysis and Simulation
EME: Electro-Mechanical Engineering

Overview: This DPC will demonstrate what V5 products are available, what products are coming in the future, and how V5 can assist your company's quest to produce the highest quality products in your industry. The Engineering domain is made up of seven committees that can give your company the ability to bring it's products to reality. Plan to attend the Engineering DPC sessions this spring if you want to become a key player in defining CATIA's future by reviewing current enhancement requests and defining future enhancements.

Process Group: Ship, Plant, and Fluid Systems
STR: Structures
AFS: Arrangements and Fluid Systems

Overview: The AEC DPC has been revamped to align the DPCs with the Version 5 CATIA products developed by Dassault Systemes. The Shipbuilding DPC has been renamed Structures and is responsible for all CATIA structural products. V4 topics addressed will include 3D structures, 2D building design, AEC structural frame modeling, and ship steelwork design. V5 topics will include structure design and equipment support structures. Plant Design has been renamed Arrangements and Fluid Systems. V4 topics will include AEC piping, AEC ductwork, AEC raceways, and tubing design. V5 topics will include plant layout, systems routing, tubing design, piping design, HVAC design, piping and instrumentation diagrams, and equipment arrangement. Dassault Systemes is still porting functionality from V4 to V5 in all these areas.

Process Group: Digital Enterprise Infrastructure
SSH: Systems Software, Hardware, and Administration
TRD: Training and Documentation
DAI: Data Exchange and Interoperability

Overview: Just as DPCs are vital to COE and Dassault Systemes, the Digital Enterprise Infrastructure DPC provides the nucleus and core foundation for each of the functional product areas defined in the ENOVIA PPR architecture. This DPC is key to our ability to implement and develop our infrastructure, exchange data between sites and between V4 and V5, and learn how to fully realize the potential of what CATIA and ENOVIA may offer our respective companies and products.

Process Group: Manufacturing
DMN: Digital Manufacturing NC
DIT: Digital Inspection and Tolerancing
DEL: DELMIA/Process Planning and Manufacturing Simulation

Overview: The Manufacturing DPC will have some very interesting and fact-filled sessions for this spring's COE conference. The DELMIA (DEL) DPC will focus on providing the information needed to address the growing use of manufacturing simulation tools. The Digital Manufacturing NC (DMN) DPC will be discussing the status of the migration paths to V5 from NCMILL and MFGPROG. The Digital Inspection and Tolerancing (DIT) DPC will host DELMIA as they share strategic directions and future product content of their new off-line inspection software, which will be in its released version come this spring. DELMIA will also demonstrate and discuss the link between FTA, DELMIA Inspect, and the Metrologic CMM operating system. All of the DPCs will have a session that will be used to demonstrate the newest release of their specific software functionality and review existing and new enhancement requests.

Process Group: Advanced Planning
ADV: Advanced Planning

Overview: The Advanced Planning DPC will be dedicated to new topics not already a part of an existing DPC. The objective of the two strategy sessions will be to present new domains and to analyze the interest of the customers. Depending on attendance, a new chairman may also be elected. In most cases, the new domains, which will be integrated in ADV sessions, are known and decided late. So don't forget to consult the last DPC planning when arriving at the COE conference.

COE Fall 2001 Conference & TechniFair Best Speakers Named

The best speakers were chosen through the individual session surveys and comments received at the conference. One winner was chosen from each of the five PIC Divisions, and one General Session was chosen. The winners will be recognized for their contributions to the success of the COE Conferences at the Spring 2002 COE Conference, and will be provided with a trophy.

• Product Definition: AS-8: "Understanding CATIA V5 Generative Assembly Structural Analysis (GAS)"; speaker Hans Kraus, IBM
• Manufacturing: NC-6: "Preparations Toward CATIA V5 Manufacturing"; speakers Jay Smith, Black & Decker; and Mark Chitjian, IBM
• Information Management: DE-5: "CATIA V4/V5 Interoperability"; speaker Frederic Beaudin, Dassault Systemes Canada
• Infrastructure: KBE-4: "Smart Shuttle: Knowledge Based Engineering in a Reusable Launch Vehicle Design"; speaker Brian Barsamian, MSC Software
• General Session: G-8: "Kumho Tire Deploys CATIA V4-V5 Worldwide"; speaker Hamid Aboutorabi, Kumho Tire
• Industry Specific: AC-3: "Work-Based Training and Development"; speaker Joyce Tucker, Newport News Shipbuilding

Visit http://www.coe.org/memcenter/proceedings/proceedingsindex.cfm to view session materials from these winning presentations. This page is for COE members only. To become a member, renew your membership, or to check your password, contact info@coe.org.

Renew Your COE Membership for 2002

As of December 31, your 2001 COE membership benefits expired! But it's not too late to renew for 2002. Please contact COE Headquarters at info@coe.org for more information about membership renewal or to join COE for the first time. Renew or join by Friday, March 1 to be eligible for the early conference registration discount and save $325!